Description
PlasmaQuant MS: ICP-MS tailored to your requirements
- Sensitive – 1500 Mcps/ppm at <2 % CeO
- Cost-effective – half the argon consumption
- Fast – 50 % higher sample throughput
- Robust – matrix-independent long-term stability
- Versatile – optimized for research and routine use
Configure your personal ICP-MS
The PlasmaQuant MS series offers four models optimized for individual application requirements. Together with a range of upgrade options and accessories, the systems can be optimally adapted to the respective field of application.